This inventor holds 2 USPTO granted patents. Top assignees: Fuji Electric Co., Ltd., Fuji Electric Corporate Research and Developement Ltd.. Active years: 1984-1986.
Company Filing History:
2 out of 4,826 
1 out of 41 
Years Active: 1984-1986
Title: Kunio Sukigara: Innovator in Gas Analysis and Amorphous Silicon Production
Introduction
Kunio Sukigara is a notable inventor based in Yokosuka, Japan. He has made significant contributions to the fields of gas analysis and semiconductor manufacturing. With a total of 2 patents, his work has had a lasting impact on technology and innovation.
Latest Patents
Sukigara's latest patents include an infrared gas analyzer and a method for producing amorphous silicon layers. The infrared gas analyzer utilizes infrared radiation transmitted through a measuring cell to detect gas composition. This device features a tubular filter that removes particulate material from the gas before it reaches the infrared detector. His method for producing amorphous silicon layers involves plasma-enhanced chemical vapor deposition (CVD). This innovative process improves deposition rates and reaction gas efficiency by selectively removing hydrogen gas from the reaction chamber.
Career Highlights
Throughout his career, Kunio Sukigara has worked with prominent companies such as Fuji Electric Co., Ltd. and Fuji Electric Corporate Research and Development Ltd. His experience in these organizations has allowed him to develop and refine his inventions, contributing to advancements in technology.
Collaborations
Sukigara has collaborated with notable colleagues, including Toyoki Kazama and Harutaka Taniguchi. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Kunio Sukigara's contributions to gas analysis and amorphous silicon production highlight his role as a significant inventor in the field. His innovative patents and collaborations reflect his dedication to advancing technology.