Shimotsuga, Japan

Kunio Kato

This inventor holds 1 USPTO granted patent. Top assignee: Fujitsu Corporation. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kunio Kato. Retrieved from https://idiyas.com/inventor/kunio-kato-ow4ru1oo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Kunio Kato: Innovator in IC Sheet Processing Technology

Introduction

Kunio Kato is a notable inventor based in Shimotsuga, Japan. He has made significant contributions to the field of integrated circuit (IC) processing technology. His innovative approach has led to advancements that enhance the efficiency of IC manufacturing.

Latest Patents

Kunio Kato holds a patent for an "IC sheet cutting press and IC sheet processing apparatus using the same." This invention performs a series of press cutting operations to separate ICs from an IC sheet while feeding the IC sheet stepwise. The design includes a series of press molds and an IC feed mechanism mounted on a common die set, forming a single press mold unit. This allows for easy exchange of the press mold unit when different types of IC sheets are processed, improving operational efficiency and compatibility.

Career Highlights

Kato is associated with Fujitsu Corporation, where he has applied his expertise in IC processing technology. His work has been instrumental in developing systems that automate the cutting and processing of IC sheets, thereby enhancing productivity in manufacturing environments.

Collaborations

Some of his notable coworkers include Tatsuo Kimura and Yukio Kato, who have collaborated with him on various projects within the field of IC technology.

Conclusion

Kunio Kato's contributions to IC sheet processing technology exemplify innovation in the manufacturing sector. His patent reflects a commitment to improving efficiency and automation in IC production.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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