This inventor holds 1 USPTO granted patent. Top assignee: Kimmon Manufacturing Co., Ltd.. Active years: 1985.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1985
Title: Kunio Arakawa: Innovator in Flow Meter Technology
Introduction
Kunio Arakawa is a notable inventor based in Urawa, Japan. He has made significant contributions to the field of flow measurement technology. His innovative designs have paved the way for advancements in various industrial applications.
Latest Patents
Arakawa holds a patent for a flow meter. This invention features a cylindrical member containing a vane wheel, which is fitted in a measuring chamber of a casing. The design ensures that the cylindrical member closely contacts the peripheral wall of the casing. A cover is placed on the cylindrical member, and rectangular inlet and outlet nozzles in the side wall communicate with the casing's inlet and outlet ports. Additionally, a pivot supporting the vane wheel is replaceably attached to the bottom portion of the cylindrical member. The supporting shaft of the vane wheel extends upward through a center opening in the cover to connect to a measuring mechanism. This innovative design enhances the accuracy and efficiency of flow measurement.
Career Highlights
Kunio Arakawa is associated with Kimmon Manufacturing Co., Ltd., where he has contributed to the development of advanced measurement technologies. His work has been instrumental in improving the performance and reliability of flow meters in various applications.
Collaborations
Arakawa has collaborated with Hajime Onoda, further enhancing the innovative capabilities within his field. Their partnership has led to the development of cutting-edge technologies that benefit the industry.
Conclusion
Kunio Arakawa's contributions to flow meter technology exemplify his dedication to innovation and excellence. His patent and collaborative efforts continue to influence the field positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile