Kunihiko Takeyama

Title: **Innovations by Kunihiko Takeyama: Pioneering Advances in Ion Implantation Technology**

Introduction

Kunihiko Takeyama is a notable inventor based in Kyoto, Japan, recognized for his significant contributions to the field of semiconductor technology. With a total of two patents to his name, Takeyama has made remarkable innovations that enhance the processes of ion implantation in semiconductor manufacturing.

Latest Patents

Kunihiko Takeyama's latest patents focus on advanced apparatuses for ion implantation. One of his unique inventions is an apparatus that includes contactless cooling and a beam wafer disk designed to hold wafers in position using centrifugal force. This innovative rotating shaft is supported by a magnetic levitation bearing system, featuring both thrust and radial bearings.

The design incorporates an annular groove that forms a heat radiating zone beneath the wafer receiving faces of the disk. A cooling plate, maintained at a temperature below that of liquid nitrogen, is inserted into the groove without any physical contact. This allows the wafer disk to be cooled through heat radiation, facilitating the implantation of ions at low doses into rapidly rotating wafers while significantly enhancing the quality post-implantation. This advanced design minimizes the development of triboelectricity, which contributes to more accurate ion beam current measurements.

In addition, Takeyama has developed an ion implanter designed for batch processing of semiconductor wafers. This ion implanter features a centrifugally-held wafer disk, which contains a series of wafer rests that present a conically curved surface. As the disk rotates, the wafers are securely pushed onto these surfaces, ensuring that the ion beam emitted during implantation remains perpendicular to the surfaces of the wafers, thus improving the process precision.

Career Highlights

Kunihiko Takeyama is currently affiliated with Nissin High Voltage Co., Ltd., where he continues to push the boundaries of semiconductor technology through his innovative inventions. His commitment to advancing the efficiency and effectiveness of ion implantation has positioned him as a prominent figure in this specialized field.

Collaborations

Throughout his career, Takeyama has likely engaged with various research institutions and companies to refine and implement his technologies, although specific collaborations are not detailed in the available information. His work contributes to a broader community focused on the evolution of semiconductor processes, impacting the industry positively.

Conclusion

Kunihiko Takeyama exemplifies the innovative spirit found among contemporary inventors, with his work in ion implantation technology showcasing how creativity and engineering come together to enhance semiconductor manufacturing. His patents reflect a commitment to precision and quality, paving the way for future developments in the field. As technology continues to advance, the contributions of inventors like Takeyama remain crucial for driving ongoing innovation within the industry.