The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 1993
Filed:
Jan. 27, 1992
Applicant:
Inventor:
Kunihiko Takeyama, Kyoto, JP;
Assignee:
Nissin High Voltage Co., Ltd., Kyoto, JP;
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
25044011 ; 25044211 ; 269238 ;
Abstract
An ion implanter for implanting ions into a batch of semiconductor wafers comprises a wafer holding disk of the centrifugal holding type, and a plurality of wafer rests in the wafer holding disk having a wafer holding surface which is conically curved. When the wafer holding disk is rotated, the wafer is pushed onto the wafer holding surface so that the surface of the wafer is curved nearly in the same manner as the conically-curved inner surface of the peripheral portion of the s wafer holding disk As a result, an ion beam being irradiated upon the surface of the wafer is always perpendicular to the surface of the wafer.