Itoigawa, Japan

Kunihiko Otsuka



Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Kunihiko Otsuka: Innovator in Chloroprene Rubber Composition

Introduction

Kunihiko Otsuka, a distinguished inventor from Itoigawa, Japan, has made significant contributions to the field of materials science, particularly through his development of innovative rubber compositions. His inventive work showcases the importance of advancements in polymers and adhesives that cater to various applications.

Latest Patents

Otsuka holds a patent for a chloroprene rubber composition and an adhesive composition utilizing this chloroprene rubber. The objective of his invention is to provide a chloroprene polymer composition that demonstrates exceptional resistance to discoloration due to heat and light exposure. This patented chloroprene rubber composition is prepared through emulsion polymerization, incorporating a rosin acid salt as an emulsifier and terminating the process with a polymerization inhibitor and an antioxidant, which can be based on phosphorus or phenol. This innovative formulation makes the product highly suitable for adhesion to materials such as cloths, leathers, foamed sheets, papers, woods, and shoe components.

Career Highlights

Kunihiko Otsuka is affiliated with Denka Company Limited, where he applies his expertise in polymer science and innovation. His focus on enhancing the properties of chloroprene rubber have placed him among notable inventors in the field, contributing valuable intellectual property to the company and advancing industry standards.

Collaborations

Throughout his career, Otsuka has partnered with talented colleagues, including Hiroyuki Yashima and Sachiyo Kishi. These collaborations reflect a shared commitment to innovation, enabling the development of cutting-edge solutions in their respective areas of expertise.

Conclusion

Kunihiko Otsuka exemplifies the spirit of innovation within the realm of polymer applications. His patented work on chloroprene rubber compositions underscores the ongoing need for advancements that enhance material properties, ultimately benefiting various industries dependent on adhesive technologies. Otsuka's contributions will doubtlessly inspire future innovations, paving the way for continued progress in material science.

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