Kunihiko Kasama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of patterning methods for chemical amplification type resist films. With a total of 4 patents to his name, his work has had a substantial impact on the industry.

Latest Patents

One of Kunihiko Kasama's latest patents is a method for patterning chemical amplification type resist films for far ultraviolet radiation. This innovative technique involves selectively irradiating a resist film with a KrF excimer laser beam. During this process, the incident light reflects off the surface of an antireflection film, creating a first reflected light, while a second reflected light is generated from the surface of the film to be patterned. The interference between these lights results in a standing wave, characterized by alternating extreme maximum and minimum light intensities. The reflection index of the first reflected light is maintained within a range of 10 to 20%. Additionally, the thickness of the antireflection film is carefully adjusted to ensure optimal positioning of the extreme maximum and minimum within the resist film and the antireflection film, respectively.

Another notable patent by Kasama is a method for forming patterns using a photo-mask. In this process, a photo-sensitive resin film is spin-coated onto a semiconductor substrate. The surface of this film is then modified to enhance its resistivity against a development solution. Light is subsequently illuminated to transmit the photo-mask, resulting in a decreased resistivity in the surface portion of the resin film that corresponds to the desired pattern. Finally, the photo-sensitive layer is developed using the development solution, completing the pattern formation.

Career Highlights

Kunihiko Kasama is currently associated with NEC Corporation, where he continues to advance his research and development efforts in semiconductor technologies. His work has been instrumental in enhancing the efficiency and precision of semiconductor manufacturing processes.

Collaborations

Throughout his career, Kasama has collaborated with notable colleagues, including Shinji Ishida and Tadao Yasuzato. These partnerships have fostered innovation and contributed to the success of various projects within the semiconductor field.

Conclusion

Kunihiko Kasama's contributions to semiconductor patterning technologies have established him as a key figure in the industry

Profile summary based on public USPTO records.

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