Kuniharu Ohno

Title: Inventor Spotlight: Kuniharu Ohno

Introduction

Kuniharu Ohno is a notable inventor based in Miyashiro, Japan, recognized for his contributions to the semiconductor manufacturing industry. His work primarily focuses on innovations that enhance the efficiency and effectiveness of photoresist technologies.

Latest Patents

Kuniharu Ohno holds a patent for an "Apparatus for treating photoresists," which involves an ultraviolet radiation process applicable in the manufacture of semiconductor devices. This innovation is aimed at improving the thermal stability of a photoresist film on a semiconductor wafer. The patented method employs ultraviolet irradiation to treat a photoresist pattern efficiently, preventing deformation caused by light from a discharge lamp, such as a high-pressure mercury vapor lamp. By selectively intercepting or reducing specific wavelengths in the spectral response region of the photoresist, his approach enhances the treatment process.

Career Highlights

Currently, Kuniharu Ohno is associated with Ushio Denki, where he continues to develop and refine technologies essential for semiconductor fabrication. His expertise in photoresist treatment has contributed significantly to advancements in the industry, leading to more robust manufacturing processes.

Collaborations

Throughout his career, Kuniharu Ohno has collaborated with several talented individuals, including coworkers Shinji Suzuki and Tetsuji Arai. Their collective efforts demonstrate the power of teamwork in driving innovation and producing high-impact technological solutions.

Conclusion

In summary, Kuniharu Ohno's inventive spirit and focus on improving semiconductor manufacturing processes make him a key figure in the field of technology. His patent on the apparatus for treating photoresists exemplifies the critical advancements being made to enhance device performance and reliability. With a strong commitment to innovation, Ohno continues to influence the future of semiconductor technology.