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For the Inventor, By the Inventor

Tokyo, Japan

Kuniaki Goto

This inventor holds 15 USPTO granted patents. Top assignees: Nippon Zeon Company, Ltd., Japan as Represented by Director General of Agency of Industrial Science, Taisho Pharmaceutical Co., Ltd.. Active years: 1976-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kuniaki Goto. Retrieved from https://idiyas.com/inventor/kuniaki-goto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15

% Patents Active = 100.0

Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 94(Granted Patents)


Location History:

  • Tokyo, JA (1976 - 1977)
  • Setagaya, JP (1994)
  • Tokyo, JP (1978 - 2002)

Company Filing History:

goldMedal12 out of 598 
 
Nippon Zeon Company, Ltd.
 patents
silverMedal1 out of 90 
 
Japan as Represented by Director General of Agency of Industrial Science
 patents
bronzeMedal1 out of 314 
 
Taisho Pharmaceutical Co., Ltd.
 patents
4. 3 out of 834,453 
Other
 patents
where one patent can have more than one assignee

Years Active: 1976-2002

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15 patents (USPTO):Explore Patents
1. 6383403 - Dry etching method (2002-05-07),
2. 6322715 - Gas composition for dry etching and process of dry etching (2001-11-27),
3. 6312759 - Fluorinated hydrocarbons, detergents, deterging method, polymer-containing fluids, and method of forming polymer films (2001-11-06),
4. 6294257 - Conductive elastomer film, method for production thereof, and conductive elastomer composition (2001-09-25),
5. 6156824 - Lubricative polymer containing liquid and method of forming film of (2000-12-05),
6. 5302764 - Process for preparing trifluorohydrocarbon compound (1994-04-12),
7. 5169966 - Process for producing an .alpha.-acyloxy-.alpha., .beta.-unsaturated (1992-12-08),
8. 5084584 - Process for producing an .alpha.-acyloxy-.alpha.,.beta.-unsaturated (1992-01-28),
9. 4906768 - Process for production of oxime derivatives (1990-03-06),
10. 4668776 - Protected des-N-methylerythromycin derivative (1987-05-26),
11. 4575570 - Process for producing alpha, beta-unsaturated ketones (1986-03-11),
12. 4115355 - Novel derivatives useful as additives for inhibiting the deterioration (1978-09-19),
13. 4059563 - Novel phenol antioxidants (1977-11-22),
14. 4008284 - Novel phenol derivatives (1977-02-15),
15. 3941706 - Functional liquid (1976-03-02),

Title: Kuniaki Goto: Innovator in Dry Etching Technology

Introduction

Kuniaki Goto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of dry etching technology, holding a total of 15 patents. His innovative approaches have advanced the methods used in semiconductor manufacturing and other related industries.

Latest Patents

Among his latest patents, Goto has developed a dry etching method that utilizes a dry etching gas containing a perfluorocycloolefin. This method involves subjecting a substrate to dry etching while generating a plasma with a high-density region of at least 10 /cm. The perfluorocycloolefins used in this process typically contain 3 to 8 carbon atoms, with a preference for those having 4 to 6 carbon atoms. Additionally, he has patented a gaseous composition for dry etching that includes a perfluorocycloolefin and 1 to 40% by mole of at least one oxygen ingredient, selected from oxygen gas and oxygen-containing gaseous compounds.

Career Highlights

Kuniaki Goto has worked with notable companies, including Nippon Zeon Company, Ltd. His work has been instrumental in developing advanced technologies that enhance the efficiency and effectiveness of dry etching processes.

Collaborations

Throughout his career, Goto has collaborated with esteemed colleagues such as Toshiro Yamada and Akira Sekiya. These partnerships have fostered innovation and contributed to the success of various projects in the field.

Conclusion

Kuniaki Goto's contributions to dry etching technology have established him as a key figure in the industry. His innovative patents and collaborations continue to influence advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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