Company Filing History:
Years Active: 2002
Title: Kumayasu Yoshii: Innovator in Dry Etching Technology
Introduction
Kumayasu Yoshii is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative techniques. His work primarily focuses on improving dry etching methods, which are crucial in the fabrication of electronic devices.
Latest Patents
Yoshii holds a patent for a "Dry etching method and apparatus." This invention describes an accurate dry etching technique that employs a flow of neutral radicals and a light beam. The dry etching apparatus utilizes a neutral radical flow source and a light beam to irradiate the flow of neutral radicals. This process reduces the velocity component of the neutral radicals parallel to the surface of the object being etched. As a result, it allows for anisotropic etching of the object while minimizing damage to dielectric or semiconductor layers due to ions. He has 1 patent to his name.
Career Highlights
Kumayasu Yoshii is associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to collaborate with other talented professionals in the field.
Collaborations
Some of his notable coworkers include Masao Shimizu and Kiyoshi Yasutake. Their collective expertise has contributed to advancements in semiconductor technologies.
Conclusion
Kumayasu Yoshii's innovative approach to dry etching technology has made a significant impact in the semiconductor industry. His contributions continue to influence the development of more efficient manufacturing processes.