The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
Sep. 17, 1998
International Business Machines Corporation, Armonk, NY (US);
Abstract
An accurate dry etching technique is described that employs a flow of neutral radicals and a light beam. A dry etching apparatus employs a neutral radical flow source and a light beam to irradiate a flow of neutral radicals , so that the velocity component of the neutral radicals parallel to the surface of an object to be etched is reduced, and etches anisotropically the object to be etched, while the object is exposed to the radical flow whose parallel velocity component is decreased. The invention reduces the problem of etching parallel to the substrate while etching perpendicular to the substrate to improve anisotropic dry etching without any adverse or damage producing effect to dielectric or semiconductor layers due to ions.