Company Filing History:
Years Active: 2002
Title: Kiyoshi Yasutake: Innovator in Dry Etching Technology
Introduction
Kiyoshi Yasutake is a notable inventor based in Minou, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative techniques. His work primarily focuses on improving dry etching methods, which are crucial in the fabrication of electronic devices.
Latest Patents
Yasutake holds a patent for a "Dry etching method and apparatus." This invention describes an accurate dry etching technique that employs a flow of neutral radicals and a light beam. The apparatus utilizes a neutral radical flow source and a light beam to irradiate the flow of neutral radicals. This process reduces the velocity component of the neutral radicals parallel to the surface of the object being etched. As a result, it allows for anisotropic etching of the object while minimizing damage to dielectric or semiconductor layers due to ions. He has 1 patent to his name.
Career Highlights
Kiyoshi Yasutake is associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has positioned him as a key player in advancing etching technologies that enhance the precision and efficiency of semiconductor manufacturing processes.
Collaborations
Yasutake has collaborated with notable colleagues such as Masao Shimizu and Kumayasu Yoshii. Their combined expertise has contributed to the development of innovative solutions in the field of semiconductor technology.
Conclusion
Kiyoshi Yasutake's contributions to dry etching technology have made a significant impact on the semiconductor industry. His innovative methods continue to influence the way electronic devices are manufactured, showcasing the importance of advancements in this field.