San Diego, CA, United States of America

Kumar Bhupendra

This inventor holds 1 USPTO granted patent. Top assignee: Nanyang Technological University. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kumar Bhupendra. Retrieved from https://idiyas.com/inventor/kumar-bhupendra

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Kumar Bhupendra in Nanostructure Patterning

Introduction

Kumar Bhupendra is an accomplished inventor based in San Diego, California. He has made significant contributions to the field of nanotechnology, particularly in the area of nanostructure patterning. His innovative approach has the potential to impact various applications in electronics and materials science.

Latest Patents

Kumar holds a patent for a method of patterning nanostructures. This method involves printing an ink containing nanostructures onto a solvent-extracting first surface, resulting in a distinct pattern of nanostructures formed on that surface. This innovative technique showcases his expertise and creativity in the field.

Career Highlights

Kumar is affiliated with Nanyang Technological University, where he continues to advance his research and development efforts. His work has garnered attention for its potential applications in various industries, including electronics and materials engineering.

Collaborations

Kumar has collaborated with notable colleagues such as Yuanyuan Zhang and Zongbin Wang. These partnerships have further enriched his research and contributed to the advancement of nanotechnology.

Conclusion

Kumar Bhupendra's contributions to the field of nanostructure patterning exemplify the innovative spirit of modern inventors. His work not only enhances our understanding of nanotechnology but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…