Company Filing History:
Years Active: 2001
Title: Kuang-Hua Shih: Innovator in Semiconductor Technology
Introduction
Kuang-Hua Shih is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of etching processes for semiconductor wafers. His innovative approach has led to the development of a patented method that enhances the efficiency and precision of semiconductor manufacturing.
Latest Patents
Kuang-Hua Shih holds a patent for a method for etching a poly-silicon layer of a semiconductor wafer. This invention provides a detailed process that involves a dielectric layer, a poly-silicon layer containing dopants, and a photo-resist layer. The method includes two distinct dry-etching processes performed in a plasma chamber, utilizing different etching gases to achieve the desired results. The main etching gas used in the first process is C,F,. This patent reflects his expertise and innovative thinking in semiconductor fabrication.
Career Highlights
Shih is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to contribute to advancements in semiconductor technology. His dedication to research and development has positioned him as a key figure in his field.
Collaborations
Some of his coworkers include Jui-Tsen Huang and Tsu-An Lin. Their collaboration has likely fostered an environment of innovation and creativity, leading to advancements in semiconductor processes.
Conclusion
Kuang-Hua Shih's contributions to semiconductor technology through his patented methods demonstrate his commitment to innovation. His work continues to influence the industry and pave the way for future advancements in semiconductor manufacturing.