Taipei, Taiwan

Kuan-Hua Lin


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):

Title: Innovations of Kuan-Hua Lin: A Pioneer in Metal-Insulator-Metal Devices

Introduction

Kuan-Hua Lin, an innovative inventor based in New Taipei, Taiwan, has made significant contributions to the field of integrated circuit technology. With a focus on enhancing the performance of electronic devices, Lin has secured a patent that underscores his expertise and dedication to advancing semiconductor technology.

Latest Patents

Kuan-Hua Lin holds a patent for a "Metal-insulator-metal device with improved performance." This invention features various embodiments directed towards an integrated chip (IC) that includes a first inter-metal dielectric (IMD) structure positioned over a semiconductor substrate. The metal-insulator-metal (MIM) device incorporated into this IC consists of at least three metal plates that are spaced apart, allowing for enhanced functionality. Additionally, it comprises multiple capacitor insulator structures, which are strategically placed to electrically isolate the neighboring metal plates, thereby improving the performance of the device.

Career Highlights

Lin currently works at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His association with such a prominent company highlights his role in driving innovation within the field. Kuan-Hua Lin's technical expertise has undoubtedly contributed to the expanding boundaries of integrated circuit design and performance.

Collaborations

Throughout his career, Kuan-Hua Lin has collaborated with esteemed colleagues, including Min-Feng Kao and Dun-Nian Yaung. These partnerships reflect the collaborative spirit of innovation within the semiconductor community, where collective efforts lead to breakthrough advancements in technology.

Conclusion

Kuan-Hua Lin continues to be a vital innovator in the semiconductor industry with his patent for a metal-insulator-metal device. His work at Taiwan Semiconductor Manufacturing Company Limited and collaborations with fellow inventors affirm his commitment to pioneering advancements that improve the efficiency and performance of integrated circuits. As technology evolves, Lin's contributions will undoubtedly play a crucial role in shaping the future of electronics.

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