Branford, CT, United States of America

Kshama Jirage


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2008-2015

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2 patents (USPTO):

As a specialist in innovations, inventions, inventors, patent attorneys, assignees, and patents, I'll create an article about inventor Kshama Jirage based on the provided data.

Title: Innovator Spotlight - Kshama Jirage: Pioneering Defect Reduction in Semiconductor Manufacturing

Introduction:

Kshama Jirage is a distinguished inventor based in Branford, CT, who holds two groundbreaking patents in the field of semiconductor applications. His revolutionary work focuses on defect reduction in electrodeposited copper, significantly enhancing the quality and performance of semiconductor integrated circuits.

Latest Patents:

Jirage's latest patents showcase his expertise in semiconductor manufacturing processes. The innovative method he developed involves electroplating a copper deposit onto a semiconductor integrated circuit device substrate with submicron-sized features. By utilizing a specialized electroplating bath containing ionic copper and a defect-reducing agent, Jirage has successfully minimized protrusion defects, surface roughness, and voiding in the copper deposit, thereby improving macro-scale planarity across the wafer.

Career Highlights:

Currently affiliated with Enthone Incorporated, Kshama Jirage continues to drive technological advancements in the semiconductor industry. His comprehensive knowledge and inventive solutions have positioned him as a key player in the field of semiconductor manufacturing.

Collaborations:

Within Enthone Incorporated, Jirage collaborates closely with esteemed colleagues such as John Commander and Richard W Hurtubise. Together, they work towards implementing cutting-edge technologies and processes to address the evolving needs of the semiconductor market.

Conclusion:

In conclusion, Kshama Jirage's contributions to the semiconductor industry through his patented innovations demonstrate a commitment to excellence and a passion for advancing technological capabilities. His relentless pursuit of defect reduction in semiconductor applications marks him as a visionary inventor shaping the future of semiconductor manufacturing.

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