Kristof Custers

Title: The Innovative Mind of Kristof Custers

Introduction

Kristof Custers is a notable inventor based in Hamont-Achel, Belgium. He has made significant contributions to the field of lithography, particularly in the development of advanced pellicle frames for extreme ultraviolet (EUV) lithography. His work is essential in enhancing the precision and efficiency of semiconductor manufacturing.

Latest Patents

Kristof holds a patent for a pellicle frame designed for EUV lithography. This innovative pellicle frame includes a first portion and a plurality of second portions. The first portion is intended for connection to a border of a pellicle and features a hollow, generally rectangular body. The second portions are designed for connection to a patterning device. Notably, all components are formed from the same material, which provides advantages in terms of manufacturing and performance. He has 1 patent to his name.

Career Highlights

Kristof Custers is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. His role involves working on cutting-edge technologies that drive advancements in lithography systems. His expertise and innovative approach have positioned him as a valuable asset in his field.

Collaborations

Throughout his career, Kristof has collaborated with talented individuals such as Ron Geeraard Catharina De Bruijn and Matthias Kruizinga. These collaborations have fostered an environment of innovation and creativity, leading to significant advancements in their projects.

Conclusion

Kristof Custers exemplifies the spirit of innovation in the semiconductor industry. His contributions, particularly in the realm of EUV lithography, highlight the importance of inventive thinking in advancing technology. His work continues to influence the future of semiconductor manufacturing.