Southgate, MI, United States of America

Kristina M Tkacz

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Henkel Ag & Company, Kgaa. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kristina M Tkacz. Retrieved from https://idiyas.com/inventor/kristina-m-tkacz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Kristina M. Tkacz: Innovator in Hazardous Material Application

Introduction

Kristina M. Tkacz is a notable inventor based in Southgate, MI (US). She has made significant contributions to the field of hazardous material application, showcasing her innovative spirit and technical expertise.

Latest Patents

Kristina holds a patent for an "Applicator for Hazardous Materials." This invention features pen-type hazardous material applicators that are particularly useful for applying metal pretreatment material to intricate geometries. These applicators can effectively reach difficult areas such as blind holes, through holes, rivets, crevices, chamfers, counterbores, and countersinks.

Career Highlights

Kristina is currently employed at Henkel AG & Company, KGaA, where she continues to develop innovative solutions in her field. Her work has been instrumental in enhancing the efficiency and safety of hazardous material applications.

Collaborations

Throughout her career, Kristina has collaborated with talented individuals such as Bashir M. Ahmed and Omar Lufti Abu-Shanab. These partnerships have contributed to the advancement of her projects and innovations.

Conclusion

Kristina M. Tkacz exemplifies the spirit of innovation in hazardous material application. Her contributions through her patent and work at Henkel AG & Company, KGaA highlight her commitment to improving safety and efficiency in challenging environments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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