Company Filing History:
Years Active: 2009
Title: Innovations by Krista Aiello in Semiconductor Cleaning Technology
Introduction
Krista Aiello is an accomplished inventor based in Hudson, NH (US). She has made significant contributions to the field of semiconductor technology, particularly in the area of surface cleaning methods. Her innovative approach has the potential to revolutionize the way contaminants are removed from semiconductor wafers.
Latest Patents
Krista Aiello holds a patent for a method of surface cleaning that focuses on removing photoresist from semiconductor wafers. This system utilizes a solid-state laser with wavelengths in the near-visible and visible portions of the electromagnetic spectrum. The technology allows for the removal of photoresist without the need for hazardous gases or wet solutions. Importantly, it does not damage the substrate being cleaned, nor does it leave a carbon residue that would require further processing. The system employs photon energy, oxygen, water vapor, and ozone to create a gas reaction zone (GRZ) that effectively interacts with contaminants, ensuring complete removal of unwanted materials.
Career Highlights
Krista Aiello is currently employed at Uvtech Systems, Inc., where she continues to develop and refine her innovative cleaning technologies. Her work has positioned her as a key player in the semiconductor industry, contributing to advancements that enhance efficiency and safety in manufacturing processes.
Collaborations
Some of Krista's notable coworkers include David J Elliott and Ronald P Millman, Jr. Their collaborative efforts contribute to the innovative environment at Uvtech Systems, Inc., fostering advancements in semiconductor cleaning technologies.
Conclusion
Krista Aiello's contributions to semiconductor cleaning technology exemplify the impact of innovation in the field. Her patented method not only improves cleaning efficiency but also prioritizes safety and environmental considerations.