The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2009
Filed:
Nov. 29, 2004
David J. Elliott, Wayland, MA (US);
Ronald P. Millman, Jr., Taunton, MA (US);
Murray Tardif, Townsend, MA (US);
Krista Aiello, Hudson, NH (US);
David J. Elliott, Wayland, MA (US);
Ronald P. Millman, Jr., Taunton, MA (US);
Murray Tardif, Townsend, MA (US);
Krista Aiello, Hudson, NH (US);
UVTech Systems, Sudbury, MA (US);
Abstract
A system for removing photoresist from semiconductor wafers is disclosed. The system utilizes a solid-state laser having wavelengths in the near-visible and visible portions of the electromagnetic spectrum to remove photoresist without requiring hazardous gases or wet solutions. In addition, the system does not damage the substrate being cleaned, nor leave a carbon residue requiring further processing to remove. The system uses photon energy, oxygen, water vapor and ozone to interact with contaminants on a surface, forming a gas reaction zone (GRZ). The GRZ reacts and completely removes the photoresist or other unwanted contamination.