Deptford, NJ, United States of America

Krishnamurthy Sridhar

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Krishnamurthy Sridhar. Retrieved from https://idiyas.com/inventor/krishnamurthy-sridhar-f5wg6ha4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:

goldMedal1 out of 834,659 
Other
 patents

Years Active: 2000

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Krishnamurthy Sridhar

Introduction

Krishnamurthy Sridhar is an accomplished inventor based in Deptford, NJ (US). He has made significant contributions to the field of environmental technology, particularly in the treatment of gaseous emissions.

Latest Patents

Sridhar holds a patent for a "Method for scrubbing gaseous emissions using bacteria." This innovative apparatus and method are designed for the control and treatment of ammonia (NH.sub.3), oxides of nitrogen (NO.sub.x), or volatile organic compounds (VOC) emitted in gaseous form from various processes. The method involves simultaneous liquid scrubbing and biochemical decomposition of these harmful compounds, effectively addressing environmental concerns.

Career Highlights

Throughout his career, Krishnamurthy Sridhar has focused on developing technologies that mitigate the impact of industrial emissions. His work has been instrumental in advancing methods that utilize biological processes for environmental remediation.

Collaborations

Sridhar has collaborated with notable professionals in his field, including Krzysztof H Turschmid and Douglas P DuFaux. These partnerships have contributed to the development and refinement of his innovative technologies.

Conclusion

Krishnamurthy Sridhar's work exemplifies the intersection of innovation and environmental responsibility. His contributions to the field of gaseous emission treatment highlight the importance of sustainable practices in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…