This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1981.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1981
Title: Innovations by Krishnamur Venkataraman
Introduction
Krishnamur Venkataraman is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of dielectric isolation.
Latest Patents
Venkataraman holds a patent for a method titled "Method for forming ultra fine deep dielectric isolation." This innovative method involves forming a first layer of material on a silicon body over a first set of alternately designated device regions. A conformal coating is then deposited over the first layer and on the silicon body included in a second set of alternately designated device regions and the designated isolation regions. The thickness of the conformal coating is carefully chosen to be substantially the width of the planned isolation between device regions. A second layer is subsequently deposited over the conformal coating. The first layer and conformal coating are composed of different materials. The topmost surface, comprising the second layer and the conformal coating, is planarized by partially removing the second layer and conformal coating from the first layer. This process ensures that the second set of alternately designated device regions in the silicon body are covered by the conformal coating and the second layer, with portions of the conformal coating separating the covers for the first and second set of device regions. The portions of the conformal coating separating the covers are then removed down to the silicon body over the designated isolation regions. A groove is etched in the silicon body using the covers as the etch mask, reaching the desired depth of the dielectric isolation in the designated isolation regions, which is typically filled by thermal oxidation.
Career Highlights
Venkataraman is currently employed at International Business Machines Corporation (IBM), where he continues to work on advancements in semiconductor technology. His expertise and innovative approach have contributed to the development of cutting-edge solutions in the industry.
Collaborations
He has collaborated with notable professionals in his field, including Bob H Yun, to further enhance the impact of his work.
Conclusion
Krishnamur Venkataraman's contributions to the field of semiconductor technology, particularly through his patented methods, highlight his role as an influential inventor. His work continues to shape advancements in dielectric isolation techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
