Kouzo Nishi

Title: Kouzo Nishi: Innovator in Substrate Processing Technology

Introduction

Kouzo Nishi is a prominent inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a patented method and apparatus that enhances the efficiency of substrate processing.

Latest Patents

Kouzo Nishi holds a patent for a substrate processing method, substrate processing apparatus, and storage medium. This patent includes a substrate processing apparatus that features a nozzle for ejecting processing liquid onto a wafer. The apparatus also comprises a force-feeding unit that delivers the processing liquid to the nozzle, along with a liquid feeding pipeline equipped with first and second valves. The controller in the apparatus is designed to manage the opening of the valves and control the pressure of the processing liquid, ensuring optimal performance.

Career Highlights

Kouzo Nishi is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing substrate processing technologies. Nishi's innovative approach has positioned him as a key figure in the development of efficient processing methods.

Collaborations

Kouzo Nishi has collaborated with notable colleagues, including Shinichi Hatakeyama and Masanobu Watanabe. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Kouzo Nishi's contributions to substrate processing technology exemplify the impact of innovation in the semiconductor industry. His patented methods and collaborative efforts continue to influence advancements in this critical field.