Kanagawa, Japan

Kouzo Murao


Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 1998-2000

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Kouzo Murao: Innovator in Amide Compound Production

Introduction

Kouzo Murao is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of chemical engineering, particularly in the production and purification of amide compounds. With a total of 3 patents to his name, Murao's work has had a considerable impact on the industry.

Latest Patents

Murao's latest patents include a process for producing an amide compound and a method for purifying a nitrile. The first patent describes a process wherein a nitrile compound is converted into the corresponding amide compound through the action of nitrile hydratase. This process is characterized by a reduction in hydrocyanic acid concentration, which effectively suppresses the decrease of enzyme activity, allowing for efficient production of the amide compound. The second patent outlines a method for purifying a nitrile by contacting it with a cation exchange resin carrying a polyamine, which removes aldehyde impurities. This ion exchange resin can be regenerated and reused, enhancing the efficiency of the purification process.

Career Highlights

Throughout his career, Kouzo Murao has worked with prominent companies such as Mitsubishi Rayon Company, Limited and Nitto Chemical Industry Co., Ltd. His experience in these organizations has allowed him to develop innovative solutions that address complex chemical challenges.

Collaborations

Murao has collaborated with esteemed colleagues, including Katsuo Ishii and Takakazu Endo. These partnerships have fostered a collaborative environment that has led to advancements in their respective fields.

Conclusion

Kouzo Murao's contributions to the field of chemical engineering, particularly in amide compound production and purification, highlight his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in research and development.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…