The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2000
Filed:
Oct. 22, 1998
Applicant:
Inventors:
Katsuo Ishii, Kanagawa, JP;
Kouzo Murao, Kanagawa, JP;
Assignee:
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C12P / ; C12N / ; C12N / ;
U.S. Cl.
CPC ...
435129 ; 435227 ; 435232 ; 435800 ; 435803 ;
Abstract
A process for producing an amide compound is described, wherein from a nitrile compound, the corresponding amide compound is produced by the action of nitrile hydratase, characterized in that the hydrocyanic acid concentration in a composition containing the nitrile compound is reduced by a chemical process, and thereafter nitrile hydratase acts on the nitrile compound. According to the invention, the decrease of the activity of the enzyme nitrile hydratase can be effectively suppressed so that an amide compound can be effectively produced from a nitrile compound.