Company Filing History:
Years Active: 2020
Title: **Kousuke Terayama: Innovator in Resist Pattern-Forming Techniques**
Introduction
Kousuke Terayama is a prominent inventor based in Tokyo, Japan. His contributions to the field of photolithography have made significant advancements in the semiconductor industry. With a focus on resist pattern-forming methods, Terayama's innovations enhance the efficiency and effectiveness of photolithography processes.
Latest Patents
Terayama has been granted a patent for his innovative resist pattern-forming method. This patent describes a process that involves applying a photoresist composition on a substrate's front face to create a photoresist film. A topcoat layer is then laminated on the photoresist film before subjecting it to liquid immersion lithography. This method includes the removal of part of the topcoat layer after lithography, followed by the development of the photoresist film. This advancement contributes to improved resolution and precision in pattern formation.
Career Highlights
Kousuke Terayama is currently associated with JSR Corporation, a company renowned for its expertise in materials for the semiconductor industry. His work and research focus on developing materials and processes that push the boundaries of current technology. Terayama's dedication to innovation in this sector has established him as a key figure in advancing resist pattern technology.
Collaborations
Throughout his career, Kousuke Terayama has collaborated with notable colleagues, including Tomohiko Sakurai and Sousuke Oosawa. These partnerships have fostered an environment of shared expertise and creativity, driving further advancements in the methodologies and technologies related to photolithography.
Conclusion
Kousuke Terayama's contributions to the field of resist pattern-forming techniques are exemplary of how innovation within the semiconductor industry can lead to significant advancements. His patent, along with his collaborative efforts at JSR Corporation, contributes to the evolution and refinement of lithography processes, ultimately shaping the future of semiconductor manufacturing.