Company Filing History:
Years Active: 1994
Title: Kousuke Imafuku: Innovator in Plasma Processing Technology
Introduction
Kousuke Imafuku is a notable inventor based in Kufu, Japan. He has made significant contributions to the field of plasma processing technology, particularly through his innovative patent. His work is essential in enhancing the efficiency and effectiveness of plasma etching processes.
Latest Patents
Kousuke Imafuku holds a patent for a "Plasma process method using an electrostatic chuck." This method involves placing a wafer on conductive support pins that extend through an electrostatic chuck. The electrostatic chuck is situated on a susceptor that incorporates a cooling jacket. By applying a potential for electrostatic attraction to the chuck, the support pins are lowered while grounded, allowing the wafer to rest on the chuck. After retracting the support pins, a heat medium gas is supplied to improve heat transfer between the wafer and the chuck. This process ultimately enhances the etching efficiency by preventing heat damage to the wafer and reducing the starting time for the etching process.
Career Highlights
Kousuke Imafuku is currently employed at Tokyo Electron Yamanashi Limited, where he continues to develop and refine technologies related to plasma processing. His expertise and innovative approach have positioned him as a key figure in his field.
Collaborations
Throughout his career, Kousuke has collaborated with esteemed colleagues such as Kazuo Fukasawa and Ryo Nonaka. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Kousuke Imafuku's contributions to plasma processing technology exemplify the impact of innovative thinking in the field of engineering. His patent and ongoing work at Tokyo Electron Yamanashi Limited highlight his commitment to advancing technology and improving industrial processes.