Company Filing History:
Years Active: 2019
Title: Kousuke Chonan: Innovator in Thin Film Technology
Introduction
Kousuke Chonan is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of thin film technology, particularly through his innovative methods and applications.
Latest Patents
Kousuke Chonan holds a patent for a "Thin film formation method, thin film, and glass plate having thin film attached thereto." This invention relates to a method for forming a titanium dioxide (TiO) thin film on a substrate using an atmospheric pressure chemical vapor deposition (CVD) method. The process involves a raw material gas that contains titanium tetraisopropoxide (TTIP) and a chloride of a metal M, which is vaporizable in a temperature range of 100 to 400 °C. The concentration ratio of the chloride of metal M to TTIP ranges from 0.01 to 0.18 mol %.
Career Highlights
Kousuke Chonan is currently employed at AGC Inc., a leading company in glass and chemical products. His work at AGC Inc. has allowed him to explore and develop advanced technologies in thin film applications.
Collaborations
Kousuke has collaborated with talented coworkers such as Hiroaki Iwaoka and Atsushi Seki. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Kousuke Chonan's innovative work in thin film technology exemplifies the importance of research and development in advancing materials science. His contributions continue to impact the industry positively.