The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2019
Filed:
May. 18, 2016
Applicant:
Agc Inc., Chiyoda-ku, JP;
Inventors:
Hiroaki Iwaoka, Tokyo, JP;
Atsushi Seki, Tokyo, JP;
Kousuke Chonan, Tokyo, JP;
Reo Usui, Tokyo, JP;
Toshio Suzuki, Tokyo, JP;
Tomomi Abe, Tokyo, JP;
Assignee:
AGC Inc., Chiyoda-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/04 (2006.01); B32B 17/06 (2006.01); C23C 16/40 (2006.01); C03C 17/245 (2006.01); C03C 17/34 (2006.01); C09D 1/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/405 (2013.01); C03C 17/2456 (2013.01); C03C 17/3417 (2013.01); C09D 1/00 (2013.01); C03C 2217/212 (2013.01); C03C 2217/73 (2013.01); C03C 2217/77 (2013.01); C03C 2218/1525 (2013.01);
Abstract
The present invention relates to a method for forming a TiOthin film on a substrate by using an atmospheric pressure CVD method, in which a raw material gas contains titanium tetraisopropoxide (TTIP) and a chloride of a metal M vaporizable in a temperature range of 100 to 400° C. and the amount of the chloride of the metal M is from 0.01 to 0.18 as a concentration ratio to the titanium tetraisopropoxide (TTIP) (chloride of metal M (mol %)/TTIP (mol %)).