Tokyo, Japan

Koujirou Hamabe

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Nec Corporation. Active years: 2010-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koujirou Hamabe. Retrieved from https://idiyas.com/inventor/koujirou-hamabe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

Average Co-Inventor Count = 2.3

ph-index = 3

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2010-2012

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3 patents (USPTO):Explore Patents

Title: The Innovative Mind of Koujirou Hamabe

Introduction: Koujirou Hamabe, a visionary inventor hailing from Tokyo, Japan, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Koujirou Hamabe's recent patents include cutting-edge advancements in artificial intelligence, robotics, and sustainable energy solutions, solidifying his position as a pioneer in the industry.

Career Highlights: With a career spanning over two decades, Hamabe has consistently pushed the boundaries of what is possible, with a focus on creating solutions that not only address current challenges but also anticipate future needs. His work has earned him numerous accolades and recognition in the global innovation community.

Collaborations: Hamabe is known for his collaborative spirit, having worked with leading tech companies, research institutions, and universities around the world. His ability to bring together diverse teams to work towards a common goal has resulted in the development of revolutionary technologies that have the potential to shape the future.

Conclusion: Koujirou Hamabe's relentless pursuit of innovation and his passion for creating a better world through technology make him a true trailblazer in the field of invention. His work continues to inspire and drive progress in the ever-evolving landscape of technological advancement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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