This inventor holds 1 USPTO granted patent. Top assignees: Hitachi Ulsi Systems Co., Ltd., Hitachi, Ltd.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 336 
1 out of 42,740 
Years Active: 2005
Title: Kouji Mikami: Innovator in Semiconductor Technology
Introduction
Kouji Mikami is a notable inventor based in Hamura, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.
Latest Patents
Mikami holds a patent for a semiconductor device and a method of manufacturing the same. This invention provides a bipolar transistor with improved performance. The design includes an insulation film made of silicon oxide, which is formed through oxidation treatment on the side surface of an emitter aperture. Additionally, an epitaxial layer composed of SiGe is selectively grown in an aperture created by removing a silicon nitride film, resulting in an undercut.
Career Highlights
Throughout his career, Kouji Mikami has worked with prominent companies such as Hitachi, Ltd. and Hitachi ULSI Systems Co., Ltd. His experience in these organizations has allowed him to develop and refine his expertise in semiconductor technology.
Collaborations
Mikami has collaborated with notable coworkers, including Takashi Hashimoto and Tsutomu Udo. Their combined efforts have contributed to advancements in the semiconductor field.
Conclusion
Kouji Mikami's work in semiconductor technology exemplifies innovation and dedication. His patent reflects a significant advancement in bipolar transistor performance, showcasing his impact on the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile