Yokohama, Japan

Kouji Hishimoto

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kouji Hishimoto. Retrieved from https://idiyas.com/inventor/kouji-hishimoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Kouji Hishimoto: Innovator in Lithography Technology

Introduction

Kouji Hishimoto is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of lithography, particularly through his innovative patent related to exposure masks.

Latest Patents

Hishimoto holds a patent for an exposure mask, a method of manufacturing the same, and an exposure method. This patent describes an exposure mask for lithography, which features a light-transmitting opening with a main light-transmitting region and phase shift regions. The design allows for improved resolution by enabling a sharp photo-intensity distribution of total transmitted light.

Career Highlights

Hishimoto is associated with Kabushiki Kaisha Toshiba, where he has been instrumental in advancing lithography technologies. His work has contributed to the enhancement of manufacturing processes in various industries.

Collaborations

Some of his notable coworkers include Akihiro Nitayama and Makoto Nakase, who have collaborated with him on various projects within the company.

Conclusion

Kouji Hishimoto's innovative work in lithography and his patent for an exposure mask demonstrate his significant impact on the field. His contributions continue to influence advancements in manufacturing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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