Kouji Arai

Title: Innovations of Kouji Arai in Silicon Substrate Technology.

Introduction

Kouji Arai is a notable inventor based in Nara, Japan. He has made significant contributions to the field of silicon substrate technology, particularly through his innovative patent that addresses the challenges associated with textured surfaces on silicon substrates.

Latest Patents

Kouji Arai holds a patent for a "Silicon substrate having textured surface, and process for producing same." This invention provides a novel silicon substrate with a textured surface achieved by dry-etching the surface of a silicon substrate with (111) orientation. The resulting substrate features multiple protrusions, each comprising three slant faces, with heights ranging from 100 to 8000 nm. The process involves preparing a silicon substrate with (111) orientation and blowing an etching gas onto its surface, which includes gases such as ClF3, XeF2, BrF3, BrF5, and NF3. Arai's patent is a testament to his innovative approach in enhancing silicon substrate properties.

Career Highlights

Kouji Arai is associated with Panasonic Intellectual Property Management Co., Ltd., where he continues to contribute to advancements in technology. His work has been instrumental in developing new methods for producing silicon substrates that meet the evolving demands of the industry.

Collaborations

Throughout his career, Arai has collaborated with esteemed colleagues, including Yasushi Taniguchi and Shigeru Sankawa, Sr. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.

Conclusion

Kouji Arai's contributions to silicon substrate technology exemplify the spirit of innovation. His patent for a textured silicon substrate showcases his ability to address complex challenges in the field. Arai's work continues to influence advancements in technology and materials science.