Company Filing History:
2 out of 23 
1 out of 10 Years Active: 2012-2013
Title: Kouichi Yoshida: Innovator in Polyurethane Foam and Polishing Pad Technology
Introduction
Kouichi Yoshida is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of materials science, particularly in the development of polyurethane foam and polishing pads. With a total of 2 patents to his name, Yoshida's work has had a considerable impact on various industries.
Latest Patents
Yoshida's latest patents include innovations in polyurethane foam and polishing pads. The polyurethane foam invention provides a material that, despite its low specific gravity, possesses favorable hardness and elasticity for use in polishing pads. This foam is created by reacting a blend composition that includes a polyisocyanate, a polyol, a chain extender with a molecular weight of 400 or less, and water. Notably, MDI is used as the main component of the polyisocyanate, with a blending amount of 45 to 70 parts by weight based on a total weight of 100 parts of the respective components.
The polishing pad invention aims to enhance the quality of objects being polished by improving their flatness. The polishing surface undergoes a mechanical process, such as buffing, to enhance its flatness. The corrugations on the polishing surface are designed with a cycle of 5 mm to 200 mm and a maximum amplitude of 40 micrometers or less. This innovation significantly improves the flatness of polished objects, such as silicon wafers.
Career Highlights
Throughout his career, Kouichi Yoshida has worked with reputable companies, including Nitta Haas Inc. and Toyo Polymer Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in material technology.
Collaborations
Yoshida has collaborated with notable professionals in his field, including Jaehong Park and Shinichi Matsumura. These collaborations have fostered innovation and the exchange of ideas, further enhancing the quality of his inventions.
Conclusion
Kouichi Yoshida's contributions to the development of polyurethane foam and polishing pads demonstrate his commitment to innovation in materials science. His patents reflect a deep understanding of the technical requirements for improving product quality in various applications.