Kamakura, Japan

Kouichi Ochiai

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Yamatake-Honeywell Co., Ltd.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kouichi Ochiai. Retrieved from https://idiyas.com/inventor/kouichi-ochiai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Kouichi Ochiai - Innovator in Flow Measurement Technology

Introduction

Kouichi Ochiai is a notable inventor based in Kamakura, Japan. He has made significant contributions to the field of flow measurement technology. His innovative approach has led to the development of a unique flow sensor that enhances measurement accuracy.

Latest Patents

Kouichi Ochiai holds a patent for a flow meter. This flow sensor comprises a flow passage, a rectifying element such as a plurality of screens or a honeycomb structure, and a flow passage reducer. The design also includes a thermal flow sensor, such as a micro bridge sensor, positioned immediately behind the reducer. This structure effectively reduces disturbances in flow, enabling highly accurate measurements across a wide range without the need for a low pass filter. He has 1 patent to his name.

Career Highlights

Kouichi Ochiai is associated with Yamatake-Honeywell Co., Ltd., where he continues to innovate in the field of flow measurement. His work has been instrumental in advancing the technology used in various applications.

Collaborations

He has collaborated with notable colleagues, including Shoji Kamiunten and Shigeru Aoshima, contributing to the development of cutting-edge technologies in their field.

Conclusion

Kouichi Ochiai's contributions to flow measurement technology exemplify the impact of innovative thinking in engineering. His work continues to influence the industry and improve measurement accuracy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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