Amagasaki, Japan

Kouichi Iio


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 1998-1999

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2 patents (USPTO):Explore Patents

Title: **Kouichi Iio: Innovator in Plasma Processing Technology**

Introduction

Kouichi Iio is a notable inventor based in Amagasaki, Japan, renowned for his contributions to plasma processing technology. With a total of two patents to his name, Iio has focused on developing advanced apparatuses that enhance processing efficiency and effectiveness in various industrial applications.

Latest Patents

Iio's latest patents demonstrate his innovative approach to plasma processing. The first patent, titled "Plasma processing apparatus," describes a system that includes a conductive thin film on the surface of a microwave introducing member that is exposed to a processing chamber. This innovative design allows the conductive thin film to act as an electrode while grounding helps to optimize the processing conditions. The second patent, "Plasma processing apparatus having a protected microwave transmission," outlines a similar apparatus featuring a microwave introducing member equipped with a dielectric member at the transmission opening. This dielectric member has a carefully calculated relative dielectric constant and insulation resistance, ensuring optimal function while maintaining safety and efficiency.

Career Highlights

Kouichi Iio is currently associated with Sumitomo Metal Industries, Inc., where he utilizes his expertise to push the boundaries of plasma processing technology. His work at the company demonstrates his commitment to innovation and technology advancement in the materials industry, contributing to the development of more effective and reliable processing systems.

Collaborations

Throughout his career, Iio has collaborated with notable coworkers, including Katsuo Katayama and Kyouichi Komachi. Together, they have shared insights and knowledge, fostering a creative environment that stimulates innovative thinking and solutions in the field of plasma processing.

Conclusion

Kouichi Iio's contributions to plasma processing technology through his patents and collaboration with industry peers position him as a significant figure in the field. His work not only enhances the capabilities of processing apparatus but also stands as a testament to the ingenuity and innovation that drives progress in technology.

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