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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5804923 B1

PDFFull Text
Date of Patent:
Sep. 08, 1998

Filed:

Jun. 14, 1996

Plasma processing apparatus having a protected microwave transmission

Applicant:
Inventors:

Kouichi Iio, Amagasaki, JP;

Kyouichi Komachi, Kobe, JP;

Katsuo Katayama, Amagasaki, JP;

Takeshi Akimoto, Tokyo, JP;

Assignee:

Sumitomo Metal Industries Limited, Osaka, JP;

Attorney:

Barnes & Thornburg

Primary Examiner:

Robert J Pascal

Assistant Examiner:

David H Vu

Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
31511121 ; 1187 / ; 1187 / ; 20429838 ;
Abstract

A plasma processing apparatus includes a microwave introducing member, which is provided with a microwave transmission opening through which microwaves pass into a processing chamber. The microwave introducing member is also provided at a transmission opening with a dielectric member. Preferably, the dielectric member is formed to have a relative dielectric constant of 4 to 10 and an insulation resistance of 10.sup.8 to 10.sup.12 .OMEGA..

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Iio, Kouichi. (1998). Plasma processing apparatus having a protected microwave transmission (U.S. Patent No. 5804923). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5804923

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