Company Filing History:
Years Active: 2006
Title: Kou Nakamura: Innovator in Semiconductor Technology
Introduction
Kou Nakamura is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of devices that utilize ferroelectric capacitors. His innovative approach has led to advancements that enhance the performance and efficiency of semiconductor devices.
Latest Patents
Nakamura holds 1 patent for his invention titled "Method for fabricating semiconductor device." This patent describes a method for creating a semiconductor device that incorporates a memory using a ferroelectric capacitor. The process involves controlling the orientation of the ferroelectric film, which is crucial for the device's functionality. The method includes a first film deposition process for forming a first ferroelectric layer and a second film deposition process for forming a second ferroelectric layer on top of the first. Notably, the film deposition temperature during the first process is set to at least 600°C, ensuring optimal conditions for the ferroelectric layer's properties.
Career Highlights
Kou Nakamura is associated with Fujitsu Corporation, a leading company in the technology sector. His work at Fujitsu has allowed him to explore and develop cutting-edge semiconductor technologies. His contributions have been instrumental in advancing the company's capabilities in this competitive field.
Collaborations
Throughout his career, Nakamura has collaborated with notable colleagues, including Yoshimasa Horii and Masaaki Nakabayashi. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in semiconductor fabrication.
Conclusion
Kou Nakamura's work in semiconductor technology exemplifies the spirit of innovation that drives the industry forward. His patented methods for fabricating semiconductor devices highlight his expertise and commitment to advancing technology. Through his contributions, he continues to influence the future of semiconductor applications.