Company Filing History:
Years Active: 2020-2022
Title: The Innovative Contributions of Kotaro Tomeoka
Introduction
Kotaro Tomeoka is a prominent inventor based in Isa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on improving the efficiency and effectiveness of lead frames and substrates used in semiconductor applications.
Latest Patents
One of Tomeoka's latest patents is for a lead frame that features a roughened silver plating layer. This layer has acicular projections and covers only the top faces of a lead frame substrate made from a copper-based material. The unique crystal structure of the roughened silver plating layer allows for improved productivity, reduced costs, and enhanced adhesion to sealing resin, all while maintaining a thin overall thickness of the plating layers.
Another notable patent involves a substrate designed for mounting semiconductor elements. This substrate includes columnar terminal portions formed by concavities on the upper surface of a copper-based metal plate. Similar to the lead frame, it is equipped with a roughened silver plating layer that enhances the thin design of semiconductor packages produced by flip-chip mounting. This innovation also contributes to improved productivity and cost reduction.
Career Highlights
Kotaro Tomeoka is currently employed at Ohkuchi Materials Co., Ltd., where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor packaging, making it more efficient and effective.
Collaborations
Tomeoka collaborates with talented coworkers, including Kaoru Hishiki and Keiichi Otaki. Their combined expertise fosters a creative environment that drives innovation in their projects.
Conclusion
Kotaro Tomeoka's contributions to semiconductor technology through his patents and work at Ohkuchi Materials Co., Ltd. highlight his role as a key innovator in the field. His advancements not only improve productivity but also enhance the overall performance of semiconductor applications.