Kotaro Asano

Title: Kotaro Asano: Innovator in Photosensitive Resin Technology

Introduction

Kotaro Asano is a prominent inventor based in Shizuoka, Japan. He has made significant contributions to the field of photosensitive resin compositions, particularly in the context of lithographic printing technologies. With a total of 2 patents to his name, Asano's work has been influential in advancing printing plate precursors.

Latest Patents

Asano's latest patents focus on innovative photosensitive resin compositions. The first patent describes a photosensitive resin composition that contains a polymer compound with a linking group represented by Formula A-1 in the main chain, along with an infrared absorbing material. In this formula, Rand Reach independently represent a hydrogen atom or a monovalent organic group, while X is a specific linking group. The second patent also pertains to a photosensitive resin composition, which includes a polymer compound with a constitutional unit represented by Formula A-1 as a constitutional unit A, and at least one constitutional unit among those represented by Formulas B-1 to B-6 as a constitutional unit B in the main chain, along with an infrared absorbing material.

Career Highlights

Kotaro Asano is currently employed at Fujifilm Corporation, where he continues to develop innovative solutions in the field of printing technology. His expertise in photosensitive materials has positioned him as a key player in the industry.

Collaborations

Asano collaborates with fellow inventor Atsuyasu Nozaki, contributing to advancements in their shared field of expertise.

Conclusion

Kotaro Asano's work in photosensitive resin technology exemplifies innovation and dedication to improving lithographic printing processes. His patents reflect a commitment to advancing the capabilities of printing materials, making a lasting impact on the industry.