This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Dowa Electronics Materials Co., Ltd.. Active years: 2015-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Okayama, JP (2015)
- Chiba, JP (2017)
Company Filing History:
Years Active: 2015-2017
Title: Kosuke Iha: Innovator in Nanoparticle Technology
Introduction
Kosuke Iha is a prominent inventor based in Chiba, Japan. He has made significant contributions to the field of nanoparticle technology, particularly in the manufacturing of fine silver particle powders. With a total of 2 patents to his name, Iha's work is paving the way for advancements in various applications.
Latest Patents
Iha's latest patents focus on the development of fine silver particle powder and methods for its manufacturing. His innovative approach provides a method suitable for mass production of nanoparticles with a uniform particle diameter. The patents detail a process that includes reducing silver in a solution containing a protective agent and a copper component, resulting in silver particles with an average diameter of 5 to 100 nm, as measured using a transmission electron microscope. This technology not only enhances the production efficiency but also ensures the quality of the nanoparticles.
Career Highlights
Kosuke Iha is currently associated with Dowa Electronics Materials Co., Ltd., where he continues to push the boundaries of nanoparticle research. His work has garnered attention for its potential applications in various industries, including electronics and materials science.
Collaborations
Iha collaborates with notable colleagues such as Shuji Kaneda and Kimikazu Motomura. Their combined expertise contributes to the innovative projects at Dowa Electronics Materials Co., Ltd.
Conclusion
Kosuke Iha's contributions to nanoparticle technology exemplify the impact of innovative thinking in modern science. His patents and ongoing research are set to influence various applications, showcasing the importance of advancements in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile