Lyons, France

Kostiantyn Achkasov

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Kostiantyn Achkasov: Innovator in Semiconductor Processing

Introduction

Kostiantyn Achkasov is a notable inventor based in Lyons, France. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent. His work focuses on enhancing the efficiency and reliability of plasma sources used in semiconductor manufacturing.

Latest Patents

Kostiantyn Achkasov holds a patent for an "Auxiliary plasma source for robust ignition and restrikes in a plasma chamber." This invention is designed to improve semiconductor processing systems by incorporating a first plasma source that can be duty cycled during the execution of a recipe on a semiconductor wafer. Additionally, the system includes a second plasma source that maintains plasma in the chamber while the first source is not active. This innovation is crucial for ensuring consistent performance in semiconductor fabrication.

Career Highlights

Kostiantyn Achkasov is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His role involves developing advanced technologies that enhance semiconductor processing capabilities. His expertise and innovative mindset have positioned him as a valuable asset to his team and the industry at large.

Collaborations

Kostiantyn collaborates with talented professionals in his field, including his coworker Kartik Ramaswamy. Together, they work on projects that push the boundaries of semiconductor technology and contribute to the advancement of the industry.

Conclusion

Kostiantyn Achkasov is a prominent figure in semiconductor innovation, with a focus on improving plasma processing systems. His contributions through patents and collaboration with industry experts highlight his commitment to advancing technology in this critical field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…