The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2025

Filed:

Dec. 15, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kartik Ramaswamy, San Jose, CA (US);

Kostiantyn Achkasov, Lyons, FR;

Nicolas J. Bright, Mountain Lakes, NJ (US);

Fernando M. Silveira, Livermore, CA (US);

Yang Yang, Cupertino, CA (US);

Yue Guo, Redwood City, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32247 (2013.01); H01J 37/32091 (2013.01); H01J 37/321 (2013.01);
Abstract

A semiconductor processing system may include a semiconductor processing chamber configured to execute a recipe on a semiconductor wafer. The system may include a first plasma source to provide plasma to the semiconductor processing chamber and to be duty cycled during an execution of the recipe. The system may also include a second plasma source configured to maintain the plasma in the semiconductor processing chamber while the first plasma source is duty cycled.


Find Patent Forward Citations

Ramaswamy, Kartik. (2025). Auxiliary plasma source for robust ignition and restrikes in a plasma chamber (U.S. Patent No. 12456607). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12456607

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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