Nagoya, Japan

Kosei Takagi

This inventor holds 10 USPTO granted patents and 1 published patent application. Top assignees: Denso Corporation, Denso Corpora Tion. Active years: 2015-2020.

USPTO Granted Patents = 10 

% Patents Active = 80.0

Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Novi, MI (US) (2015 - 2016)
  • Nagoya, JP (2015 - 2017)
  • Obu, JP (2019)
  • Kariya, JP (2018 - 2020)

Company Filing History:


Years Active: 2015-2020

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10 patents (USPTO):Explore Patents

Title: Kosei Takagi - Innovator in Vane Pump Technology

Introduction

Kosei Takagi is an inventor based in Kariya-city, Japan. He has made significant contributions to the field of pump technology, particularly with his innovative designs aimed at improving efficiency and reducing leakage in vane pumps. Although he currently holds no granted patents, his work demonstrates a commitment to advancing engineering solutions.

Latest Patent Applications

One of Kosei Takagi's notable patent applications is for a "Vane Pump and Leakage Detecting Device Using the Same." This invention features a pump chamber that accommodates a first inner plate and a second inner plate, which are movably positioned at each axial end of a rotor. When an electric motor is situated below the vane pump, gravity causes the first inner plate to move towards the second inner plate. This movement ensures that the first inner plate contacts the first axial end of the rotor, effectively closing the upper side axial open end of each pumping room defined by multiple vanes. Consequently, this design minimizes the amount of air leaking from one pumping room to the others, enhancing the overall performance of the pump.

Conclusion

Kosei Takagi's innovative approach to vane pump technology showcases his dedication to solving engineering challenges. His patent application reflects a thoughtful design aimed at improving efficiency and reducing leakage, which could have significant implications for various applications in the industry.

Profile summary based on public USPTO records.
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