Company Filing History:
2 out of 60 
1 out of 832,891 Years Active: 1994-2004
Title: Konrad Heinle: Innovator in Mechanical Masking and Alignment Systems
Introduction
Konrad Heinle is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of mechanical masking and alignment systems, holding a total of 3 patents. His innovative approaches have advanced the technology used in various applications, particularly in lithography and substrate alignment.
Latest Patents
Heinle's latest patents include a "Method and apparatus for mechanically masking a workpiece." This invention discloses a method and apparatus for mechanically masking a workpiece to form exposure exclusion regions. The apparatus features a mask that is arranged atop the photosensitive surface of the workpiece. The mask is opaque to the wavelength of radiation that activates the photosensitive workpiece surface. It is placed onto the workpiece prior to lithographic exposure, allowing for the removal of photosensitive material from select regions to provide electrical contact directly to the workpiece upper surface.
Another significant patent is the "Backside alignment system and method." This system and method perform alignment of a substrate using alignment marks on the backside of a substrate supported by a movable chuck. The system includes an imaging optical system that can position one end of the optical system adjacent to the front surface of the substrate or near the front surface but outside the perimeter of the substrate. The chuck is movable, allowing the imaging optical system to be placed in optical communication with secondary optical systems arranged within the chuck at the chuck perimeter. This innovative approach enables precise alignment and exposure based on processed digital images.
Career Highlights
Throughout his career, Konrad Heinle has worked with various companies, including Ultratech Stepper, Inc. His experience in these organizations has contributed to his expertise in the field of mechanical systems and lithography.
Collaborations
Due to space constraints, the details of collaborations will not be included.
Conclusion
Konrad Heinle's contributions to mechanical masking and alignment systems have made a significant impact in the field of technology. His innovative patents reflect his dedication to advancing the industry and improving processes in lithography and substrate alignment.