Munich, Georgia

Konrad Buehler


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations of Konrad Buehler in Poly(alkyl ethylenes)

Introduction

Konrad Buehler is a notable inventor based in Munich, Germany. He has made significant contributions to the field of polymer chemistry, particularly in the development of structurally isomeric poly(alkyl ethylenes). His innovative work has led to advancements in the processing properties of these materials.

Latest Patents

Buehler holds a patent for "Structural isomers of poly(alkyl ethylenes)." This patent describes structurally isomeric poly(alkyl ethylenes) with H and Y structures, which exhibit decreased instability in the melt and improved processing properties. The synthesis of these materials can be achieved through various methods, including irradiating, melt reaction, or solid phase reaction methods. The process involves reacting poly(alkyl ethylenes) with a small percentage of monofunctional, difunctional, and polyfunctional monomers, optionally in the presence of peroxides. These innovative materials are suitable for producing a wide range of products, including films, sheets, panels, coatings, pipes, hollow objects, and foams.

Career Highlights

Konrad Buehler is currently associated with Borealis GmbH, where he continues to work on advancements in polymer technology. His expertise and innovative approach have positioned him as a key figure in the industry.

Collaborations

Buehler has collaborated with notable colleagues, including Manfred Raetzsch and Achim Hesse. Their combined efforts have contributed to the success of various projects within the field of polymer chemistry.

Conclusion

Konrad Buehler's contributions to the development of structurally isomeric poly(alkyl ethylenes) have significantly impacted the polymer industry. His innovative approaches and collaborations continue to drive advancements in this important field.

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