Osaka, Japan

Komei Tahara

This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Kaneka Corporation. Active years: 2016-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Komei Tahara. Retrieved from https://idiyas.com/inventor/komei-tahara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2016-2017

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2 patents (USPTO):Explore Patents

Title: Komei Tahara: Innovator in Positive Photosensitive Compositions

Introduction

Komei Tahara is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of materials science, particularly in the development of positive photosensitive compositions. With a total of 2 patents, his work has implications for various applications in electronics and photolithography.

Latest Patents

Tahara's latest patents focus on positive photosensitive compositions that exhibit excellent patterning properties and electrical insulation reliability when cured as thin films. The first aspect of his invention includes a compound that contains an alkenyl group or a SiH group, which decomposes in the presence of acid to generate an acidic group or a hydroxyl group. Additionally, it incorporates a hydrosilylation catalyst and a photoacid generator, enhancing the performance of the compositions.

Career Highlights

Komei Tahara is currently associated with Kaneka Corporation, where he continues to innovate and develop new materials. His expertise in photosensitive compositions has positioned him as a key figure in the advancement of thin film technologies.

Collaborations

Tahara has collaborated with notable coworkers such as Masahito Ide and Hirofumi Inari, contributing to the collective knowledge and advancements in their field.

Conclusion

Komei Tahara's work in positive photosensitive compositions showcases his innovative spirit and dedication to advancing technology. His contributions are vital for the future of electronic materials and photolithography applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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