Tainan, Taiwan

Kom-Bei Shiu

This inventor holds 1 USPTO granted patent. Top assignee: Industrial Technology Research Institute. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kom-Bei Shiu. Retrieved from https://idiyas.com/inventor/kom-bei-shiu-nv7phbs1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: The Innovations of Kom-Bei Shiu

Introduction

Kom-Bei Shiu is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of materials science, particularly through his innovative work on photosensitive thick film compositions. His inventions are aimed at enhancing the quality and efficiency of electrode materials.

Latest Patents

Kom-Bei Shiu holds a patent for a photosensitive thick film composition. This composition is designed to produce electrode material with high resolution and high contrast. The formulation includes an acrylic copolymer, a photoinitiator, a reactive monomer, a conductive metal, glass powder, an additive, and an organic solvent. This innovative approach has the potential to advance various applications in electronics and materials engineering.

Career Highlights

Shiu is affiliated with the Industrial Technology Research Institute, where he continues to develop and refine his inventions. His work has garnered attention for its practical applications and contributions to technology.

Collaborations

Some of his notable coworkers include Tsing-Tang Song and Weir-Torn Jiang, who have collaborated with him on various projects. Their combined expertise has furthered the research and development efforts within their field.

Conclusion

Kom-Bei Shiu's contributions to the field of materials science through his innovative patents highlight the importance of research and collaboration in driving technological advancements. His work continues to inspire future innovations in electrode materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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