Paris, France

Kokoura Mensah

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignees: Centre National De La Recherche Scientifique, Ecole Superieure De Physique Et De Chimie Industrielles De La Ville De Paris, Sorbonne Université. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kokoura Mensah. Retrieved from https://idiyas.com/inventor/kokoura-mensah

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Kokoura Mensah: Innovator in Lithography Production Methods

Introduction

Kokoura Mensah is a notable inventor based in Paris, France. He has made significant contributions to the field of lithography, particularly through his innovative production methods. His work aims to enhance the efficiency and purity of devices produced using lithographic techniques.

Latest Patents

Kokoura Mensah holds a patent for a lithography production method. This method involves the deposition of a first resin layer of lithography above or on a protective layer, ensuring that the protective layer is sandwiched between a conductive layer and the first resin layer. The process includes a first lithography step that preserves the superposition of these layers in designated areas. Following this, a second resin layer is deposited without removing the first resin layer, culminating in a second lithography step. The primary goal of this method is to produce devices without introducing impurities into the conductive layer. He has 1 patent to his name.

Career Highlights

Throughout his career, Kokoura Mensah has worked with prestigious institutions such as the Centre National de la Recherche Scientifique and the École Supérieure de Physique et de Chimie Industrielles de la Ville de Paris. His experience in these organizations has contributed to his expertise in the field of lithography.

Collaborations

Kokoura Mensah has collaborated with various professionals, including Ulrich Bockelmann. Their joint efforts have further advanced the research and development of lithographic techniques.

Conclusion

Kokoura Mensah is a prominent figure in the field of lithography, with a focus on innovative production methods that enhance device quality. His contributions and collaborations continue to influence advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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