Koki Yasuda

Title: Koki Yasuda: Innovator in Dry Etching Technology

Introduction

Koki Yasuda is a prominent inventor based in Akita, Japan. He is known for his contributions to the field of semiconductor manufacturing, particularly in the development of dry etching technology. His innovative approach has led to advancements that are crucial for the production of microelectronic devices.

Latest Patents

Koki Yasuda holds a patent for a "Dry etching apparatus and method." This invention involves a dry etching apparatus that utilizes reactive gas plasma. The apparatus features a vacuum chamber with first and second electrodes positioned opposite each other. These electrodes generate gas plasma by discharging while introducing reactive gas into the chamber, effectively etching a sample placed on the first electrode. Additionally, a cover member is designed to cover the periphery portion of the sample on the surface of the first electrode. The reactive gas introducer is strategically located on the second electrode, directing the gas towards the sample for efficient etching. He has 1 patent to his name.

Career Highlights

Koki Yasuda is currently employed at Anelva Corporation, a company recognized for its expertise in vacuum technology and semiconductor manufacturing equipment. His work at Anelva has positioned him as a key player in the advancement of etching technologies.

Collaborations

Throughout his career, Koki has collaborated with notable colleagues, including Tsutomu Tsukada and Etsuo Wani. These collaborations have fostered an environment of innovation and have contributed to the success of various projects within the company.

Conclusion

Koki Yasuda's contributions to dry etching technology exemplify the importance of innovation in the semiconductor industry. His work continues to influence the development of advanced manufacturing processes, ensuring the progress of microelectronics.